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Volume 5 Issue 3
May  2023
Article Contents

Jiao B Z, Chen F Y, Liu Y C, Fan X H, Zeng S Q, Dong Q, Deng L M, Gao H, Xiong W. 2023. Acousto-optic scanning spatial-switching multiphoton lithography. Int. J. Extrem. Manuf. 5 035008.
Citation: Jiao B Z, Chen F Y, Liu Y C, Fan X H, Zeng S Q, Dong Q, Deng L M, Gao H, Xiong W. 2023. Acousto-optic scanning spatial-switching multiphoton lithography. Int. J. Extrem. Manuf. 035008.

Acousto-optic scanning spatial-switching multiphoton lithography


doi: 10.1088/2631-7990/ace0a7
More Information
  • Publish Date: 2023-05-18
  • Nano-3D printing has obtained widespread attention owing to its capacity to manufacture end-use components with nano-scale features in recent years. Multiphoton lithography (MPL) is one of the most promising 3D nanomanufacturing technologies, which has been widely used in manufacturing micro-optics, photonic crystals, microfluidics, meta-surface, and mechanical metamaterials. Despite of tremendous potential of MPL in laboratorial and industrial applications, simultaneous achievement of high throughput, high accuracy, high design freedom, and a broad range of material structuring capabilities remains a long-pending challenge. To address the issue, we propose an acousto-optic scanning with spatial-switching multispots (AOSS) method. Inertia-free acousto-optic scanning and nonlinear swept techniques have been developed for achieving ultrahigh-speed and aberration-free scanning. Moreover, a spatial optical switch concept has been implemented to significantly boost the lithography throughput while maintaining high resolution and high design freedom. An eight-foci AOSS system has demonstrated a record-high 3D printing rate of 7.6 × 107 voxel s−1, which is nearly one order of magnitude higher than earlier scanning MPL, exhibiting its promise for future scalable 3D nanomanufacturing.

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Acousto-optic scanning spatial-switching multiphoton lithography

doi: 10.1088/2631-7990/ace0a7
  • 1 Wuhan National Laboratory for Optoelectronics and School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan, Hubei 430074, People's Republic of China;
  • 2 Optics Valley Laboratory, Wuhan, Hubei 430074, People's Republic of China

Abstract: 

Nano-3D printing has obtained widespread attention owing to its capacity to manufacture end-use components with nano-scale features in recent years. Multiphoton lithography (MPL) is one of the most promising 3D nanomanufacturing technologies, which has been widely used in manufacturing micro-optics, photonic crystals, microfluidics, meta-surface, and mechanical metamaterials. Despite of tremendous potential of MPL in laboratorial and industrial applications, simultaneous achievement of high throughput, high accuracy, high design freedom, and a broad range of material structuring capabilities remains a long-pending challenge. To address the issue, we propose an acousto-optic scanning with spatial-switching multispots (AOSS) method. Inertia-free acousto-optic scanning and nonlinear swept techniques have been developed for achieving ultrahigh-speed and aberration-free scanning. Moreover, a spatial optical switch concept has been implemented to significantly boost the lithography throughput while maintaining high resolution and high design freedom. An eight-foci AOSS system has demonstrated a record-high 3D printing rate of 7.6 × 107 voxel s−1, which is nearly one order of magnitude higher than earlier scanning MPL, exhibiting its promise for future scalable 3D nanomanufacturing.

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