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Volume 3 Issue 1
Nov.  2020
Article Contents

He S X, Tian R, Wu W, Li W D, Wang D Q, Helium-ion-beam nanofabrication: extreme processes and applications. Int. J. Extrem. Manuf. 3, 012001(2021).
Citation: He S X, Tian R, Wu W, Li W D, Wang D Q, Helium-ion-beam nanofabrication: extreme processes and applications. Int. J. Extrem. Manuf. 3, 012001(2021).

Helium-ion-beam nanofabrication: extreme processes and applications


doi: 10.1088/2631-7990/abc673
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  • Publish Date: 2020-11-23
  • Helium ion beam (HIB) technology plays an important role in the extreme fields of nanofabrication. This paper reviews the latest developments in HIB technology as well as its extreme processing capabilities and widespread applications in nanofabrication. HIB-based nanofabrication includes direct-write milling, ion beam-induced deposition, and direct-write lithography without resist assistance. HIB nanoscale applications have also been evaluated in the areas of integrated circuits, materials sciences, nano-optics, and biological sciences. This review covers four thematic applications of HIB: (1) helium ion microscopy imaging for biological samples and semiconductors; (2) HIB milling and swelling for 2D/3D nanopore fabrication; (3) HIB-induced deposition for nanopillars, nanowires, and 3D nanostructures; (4) additional HIB direct writing for resist, graphene, and plasmonic nanostructures. This paper concludes with a summary of potential future applications and areas of improvement for HIB extreme nanofabrication technology.

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Helium-ion-beam nanofabrication: extreme processes and applications

doi: 10.1088/2631-7990/abc673
  • 1 Chongqing Key Laboratory of Multi-scale Manufacturing Technology, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, Chongqing 400714, People's Republic of China
  • 2 College of Physics, Sichuan University, Chengdu, Sichuan 610065, People's Republic of China
  • 3 Department of Electrical Engineering, University of Southern California, Los Angeles, CA 90089, United States of America
  • 4 Department of Mechanical Engineering, The University of Hong Kong, Pokfulam, Hong Kong, People's Republic of China

Abstract: 

Helium ion beam (HIB) technology plays an important role in the extreme fields of nanofabrication. This paper reviews the latest developments in HIB technology as well as its extreme processing capabilities and widespread applications in nanofabrication. HIB-based nanofabrication includes direct-write milling, ion beam-induced deposition, and direct-write lithography without resist assistance. HIB nanoscale applications have also been evaluated in the areas of integrated circuits, materials sciences, nano-optics, and biological sciences. This review covers four thematic applications of HIB: (1) helium ion microscopy imaging for biological samples and semiconductors; (2) HIB milling and swelling for 2D/3D nanopore fabrication; (3) HIB-induced deposition for nanopillars, nanowires, and 3D nanostructures; (4) additional HIB direct writing for resist, graphene, and plasmonic nanostructures. This paper concludes with a summary of potential future applications and areas of improvement for HIB extreme nanofabrication technology.

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